The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Aug. 13, 2004
Gian Francesco Lorusso, Fremont, CA (US);
Paola DE Cecco, Foster City, CA (US);
Luca Grella, Gilroy, CA (US);
David L. Adler, San Jose, CA (US);
David Goodstein, San Francisco, CA (US);
Chris Bevis, Los Gatos, CA (US);
Gian Francesco Lorusso, Fremont, CA (US);
Paola De Cecco, Foster City, CA (US);
Luca Grella, Gilroy, CA (US);
David L. Adler, San Jose, CA (US);
David Goodstein, San Francisco, CA (US);
Chris Bevis, Los Gatos, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
One embodiment disclosed relates to a method for accurate electron beam metrology. A substrate with a target feature is loaded into a scanning electron microscope. An electron beam is scanned over the target feature, and scattered electrons are detected therefrom. A characteristic of the target feature is measured by finding optimal values for parameters of a mathematical model which accounts for substrate charging effects. Principal component analysis may be used to advantageously result in reduced requirements for processing time and/or computational speed.