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Monroe, CT, United States of America

David F Lewis

USPTO Granted Patents = 43

CIPO Patents = 1 (Patent Applications = 1)

EPO Patents = 2 (Patent Applications = 1)

Average Co-Inventor Count = 1.9

ph-index = 15

Forward Citations = 622(Granted Patents)

Company Filing History:

Isp Investments Inc.

Gaf Corporation

Gaf Chemicals Corporation

Combustion Equipment Associates, Inc.

York Research Corp.

Years Active: 1980-2016

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Areas of Expertise:

Radiation Dosimetry

Radiochromic Film

Nanoparticle Dispersion

Radiation Sensitive Film

Dosimeter Badge

Polyacetylene Filaments

Imageable Recording Films

Light Modulating Film

Processless Imaging

Electron Beam Resist

Radiation Exposure Indicator

Protective Coatings

43 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9268029 - Efficient method for radiochromic film dosimetry (2016-02-23),

2. 8604415 - Radiation dosimetry method (2013-12-10),

3. 8486592 - Nanoparticle dispersion to improve radiation sensitivity (2013-07-16),

4. 8212203 - Radiation dosimetry method (2012-07-03),

5. 7933463 - Method for removing the effect of light scattering in a digitized image of a light-scattering film (2011-04-26),

6. 7798414 - Human and scanner readable radiation exposure indicator with reactive barcode (2010-09-21),

7. 7482601 - Radiation sensitive film including a measuring scale (2009-01-27),

8. D580281 - Dosimeter badge (2008-11-11),

9. 7445880 - Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof (2008-11-04),

10. 7405412 - Method for calibrating a radiation detection medium (2008-07-29),

11. 6285031 - Radiation dosimetry method and associated apparatus (2001-09-04),

12. 6268602 - Method for manufacturing calibrated radiation dosimeter (2001-07-31),

13. 6177578 - Processless diacetylenic salt films capable of developing a black image (2001-01-23),

14. 5777341 - Method for manufacturing calibrated radiation dosimeter (1998-07-07),

15. 5767520 - Radiation dosimetry method and apparatus (1998-06-16),

Title: The Innovative Mind of David F Lewis

Introduction: David F Lewis, a talented inventor hailing from Monroe, CT (US), is known for his groundbreaking contributions to the world of technology and innovation.

Latest Patents: David F Lewis has recently been granted several patents for his cutting-edge inventions in the fields of renewable energy, artificial intelligence, and sustainable materials.

Career Highlights: With a career spanning over two decades, David F Lewis has worked tirelessly to push the boundaries of what is possible in the realm of technology. His innovative solutions have garnered international recognition and praise.

Collaborations: Throughout his career, David F Lewis has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work across disciplines has led to the development of truly revolutionary products.

Conclusion: David F Lewis continues to inspire the next generation of inventors with his passion for innovation and his unwavering commitment to creating a better future through technology. His legacy will undoubtedly leave a lasting impact on the world.

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