Monroe, CT, United States of America

David F Lewis

This inventor holds 43 USPTO granted patents, plus 1 CIPO patent and 2 EPO patents, primarily in Radiation Dosimetry. Top assignees: Isp Investments Inc., Gaf Corporation, Gaf Chemicals Corporation. Active years: 1980-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David F Lewis. Retrieved from https://idiyas.com/inventor/david-f-lewis

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

 

Average Co-Inventor Count = 1.9

ph-index = 15

Forward Citations = 622(Granted Patents)


Company Filing History:


Years Active: 1980-2016

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Areas of Expertise:
Radiation Dosimetry
Dosimeter Badge
Radiation Sensitive Film
Nanoparticle Dispersion
Imageable Recording Films
Polyacetylene Salt Dyes
Calibration Methods
Protective Coatings
Thermosensitive Films
Radiation Exposure Indicator
Processless Imaging
Electron Beam Sensitive Resist
43 patents (USPTO):Explore Patents

Title: The Innovative Mind of David F Lewis

Introduction: David F Lewis, a talented inventor hailing from Monroe, CT (US), is known for his groundbreaking contributions to the world of technology and innovation.

Latest Patents: David F Lewis has recently been granted several patents for his cutting-edge inventions in the fields of renewable energy, artificial intelligence, and sustainable materials.

Career Highlights: With a career spanning over two decades, David F Lewis has worked tirelessly to push the boundaries of what is possible in the realm of technology. His innovative solutions have garnered international recognition and praise.

Collaborations: Throughout his career, David F Lewis has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work across disciplines has led to the development of truly revolutionary products.

Conclusion: David F Lewis continues to inspire the next generation of inventors with his passion for innovation and his unwavering commitment to creating a better future through technology. His legacy will undoubtedly leave a lasting impact on the world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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