David C Wong

Title: David C Wong: Innovator in Semiconductor Cleaning Technologies

Introduction

David C Wong is a prominent inventor based in San Jose, CA, known for his contributions to semiconductor cleaning technologies. With a total of 4 patents to his name, Wong has made significant advancements in methods for cleaning semiconductor wafers, which are crucial in the manufacturing of electronic devices.

Latest Patents

Wong's latest patents include an innovative ultra-low particle semiconductor cleaner designed for the removal of particles from semiconductor wafers. This method involves immersing a wafer in a liquid, such as water, while maintaining a substantially particle-free environment around the wafer's surfaces. Additionally, the introduction of a carrier gas containing a cleaning enhancement substance accelerates the removal of adhered liquids from the wafer. Another notable patent is a method and apparatus for cleaning wafers using multiple tanks, which features a cleaning system with multiple chambers that allow for the immersion of wafers in ultra-clean liquids. This system is equipped with a controller that manages the rate of liquid removal, enhancing the efficiency of the cleaning process.

Career Highlights

Throughout his career, David C Wong has worked with several notable companies, including Yieldup International and Cypress Semiconductor Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and cleaning methods.

Collaborations

Wong has collaborated with talented individuals in the field, including Raj Mohindra and Suraj Puri. These partnerships have likely fostered innovation and the development of advanced cleaning technologies.

Conclusion

David C Wong's contributions to semiconductor cleaning technologies have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence the field of semiconductor manufacturing.