The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1999
Filed:
Jan. 15, 1997
Kaichiu Wong, Sunnyvale, CA (US);
Krishnaswamy Ramkumar, San Jose, CA (US);
Hanna Bamnolker, San Jose, CA (US);
Suraj Puri, Los Altos, CA (US);
Rajiv Bhushan, Palo Alto, CA (US);
David Wong, San Jose, CA (US);
Gary Elmore, San Jose, CA (US);
Raj Mohindra, Los Altos, CA (US);
Cypress Semiconductor Corporation, San Jose, CA (US);
Abstract
A method is described for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance also is included. It is believed that the cleaning enhancement substance dopes any liquid adhered to the front and back faces of the wafer to cause a concentration gradient of the cleaning enhancement substance in the liquid and accelerate removal of the adhered liquid off of the water.