The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 1998

Filed:

Sep. 19, 1996
Applicant:
Inventors:

Raj Mohindra, Los Altos Hills, CA (US);

David C Wong, San Jose, CA (US);

Suraj Puri, Los Altos, CA (US);

Assignee:

YieldUP International, Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134 254 ; 134 42 ; 1341023 ; 134902 ; 134201 ;
Abstract

A cleaning system (1, 5) having multiple cleaning chambers (200) is provided. Each cleaning chamber (200) includes an interior region sufficient for immersing a carrier (242), which has at least one wafer disposed therein, into an ultra-clean liquid. The cleaning chamber (200) also has an inlet operably coupled to the interior region to introduce a gas into the interior region and a drain operably coupled to the interior region to remove the ultra-clean liquid from the interior region at a selected rate. A controller 14 is operably coupled to the chamber (200) for selectively controlling the selected rate. In an alternative embodiment, an installation technique (80) for the above cleaning system (1, 5) is provided.


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