Daniel S Fischer

Title: The Innovations of Daniel S. Fischer

Introduction

Daniel S. Fischer is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of pattern recognition and metrology. With a total of 2 patents, Fischer's work has advanced the methodologies used in design-based metrology.

Latest Patents

Fischer's latest patents focus on edge correction in pattern recognition. One of his patents, titled "Pattern recognition with edge correction for design based metrology," outlines a method that includes generating a pattern recognition output for a pattern recognition process. This process involves receiving a design layout, a sample plan based on the design layout, and a user-generated edge input. The output is configured to drive the pattern recognition process effectively. Another patent with a similar title also emphasizes the importance of user-generated edge input in generating successful SEM recipes for recognizing patterns that may deviate from the design.

Career Highlights

Daniel S. Fischer is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to explore innovative solutions in the realm of pattern recognition and metrology. His contributions have been instrumental in enhancing the accuracy and efficiency of measurement processes.

Collaborations

Fischer has collaborated with notable colleagues, including Todd Christopher Bailey and Dongbing Shao. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

Daniel S. Fischer's work in pattern recognition and metrology showcases his dedication to innovation. His patents reflect a commitment to improving design-based methodologies, making significant strides in the industry.