International Business Machines Corporation

Daniel S Fischer

Dongbing Shao

Todd Christopher Bailey

A method for edge correction in pattern recognition includes generating a pattern recognition output for a pattern recognition process, including receiving, in the processor, a design layout, receiving a sample plan based on the design layout, receiving a first user-generated edge input, generating a pattern recognition recipe output from the design layout, the sample plan and the user-generated edge input, wherein the pattern recognition recipe output is configured to drive the pattern recognition process, generating a measurement model from the pattern recognition process, generating a measurement model pattern recognition output for an measurement model pattern recognition process, including receiving a second user-generated input and generating a measurement model pattern recognition recipe output from the measurement model and the second user-generated edge input, wherein the measurement model pattern recognition recipe output configured to drive the measurement model pattern recognition process.

Pattern recognition with edge correction for design based metrology

Exemplary embodiments include a method for edge correction in pattern recognition, the method including receiving a design layout, receiving a sample plan based on the design layout, receiving user-generated edge input and generating a recipe output from the design layout, the sample plan and the user-generated edge input. The incorporation of the edge input results in SEM recipes that are much more successful in recognizing patterns that have tendency to deviate in appearance from design by, for example, moderate to severe sidewall angle.

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Wappingers Falls, NY, United States of America

Daniel S Fischer