Daniel Mateja

Title: The Innovative Contributions of Daniel Mateja

Introduction

Daniel Mateja is a notable inventor based in Oswego, IL (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 3 patents to his name. His work primarily focuses on developing compositions and methods that enhance the efficiency and effectiveness of polishing substrates in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "CMP compositions and methods for selective removal of silicon nitride." This invention provides chemical mechanical polishing compositions and methods for polishing a substrate that includes silicon dioxide and silicon nitride. The method allows for the selective removal of silicon nitride relative to silicon oxide on patterned wafers. In this embodiment, a CMP method involves abrading a surface of a substrate with a CMP composition to remove silicon nitride effectively. The composition includes a particulate abrasive, such as ceria, suspended in an aqueous carrier, and features a cationic polymer with specific chemical properties.

Another significant patent by Mateja is "Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials." This invention outlines a chemical mechanical polishing method that polishes a substrate comprising silicon dioxide, silicon nitride, and polysilicon. The method involves using a CMP composition that effectively abrades the surface to remove these materials. The composition consists of a particulate ceria abrasive suspended in an aqueous carrier, with a pH range of about 3 to 9.5, and includes a cationic polymer that enhances its performance.

Career Highlights

Daniel Mateja is currently employed at Cabot Microelectronics Corporation, where he continues to innovate in the field of semiconductor materials. His work has been instrumental in advancing CMP technologies, which are critical for the manufacturing of integrated circuits.

Collaborations

Throughout his career, Mateja has collaborated with talented professionals, including Dmitry Dinega and Sairam Shekhar. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Daniel Mateja's contributions to the field of chemical mechanical polishing are noteworthy, with several patents that enhance the efficiency of semiconductor manufacturing processes. His work at Cabot Microelectronics Corporation and collaborations with other professionals underscore his impact on the industry.