The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Mar. 13, 2013
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Brian Reiss, Woodridge, IL (US);
Michael Willhoff, Naperville, IL (US);
Daniel Mateja, Oswego, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3063 (2006.01); H01L 21/306 (2006.01); C09K 3/14 (2006.01); H01L 21/3105 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); C09K 3/1463 (2013.01); H01L 21/31053 (2013.01); C09G 1/02 (2013.01);
Abstract
The invention relates to a chemical-mechanical polishing composition comprising a ceria abrasive, cations of one or more lanthanide metals, one or more nonionic polymers, water, and optionally one or more additives. The invention further relates to a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate comprises one or more of silicon oxide, silicon nitride, and polysilicon.