Company Filing History:
Years Active: 1991-1993
Title: The Innovative Contributions of Daniel J Vitkavage
Introduction
Daniel J Vitkavage is a notable inventor based in Zionsville, Pennsylvania. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his expertise and innovative spirit. His work has had a profound impact on the development of integrated circuits and semiconductor devices.
Latest Patents
Vitkavage's latest patents include an integrated circuit with a planar dielectric layer. This invention involves a method for forming self-aligned contacts to regions between closely spaced features by utilizing differential etch rates between first and second dielectrics. Another significant patent is for a semiconductor device that features a semiconductor substrate interfaced with a single crystal semiconductor host material. This device includes an ultrathin pseudomorphic single crystal epitaxial interlayer, which is designed to match the lattice constant of the interlayer material with that of the host material. The host material can be selected from various compounds, including Ge, GaAs, InSb, and InP, while the interlayer material is typically pseudomorphic silicon.
Career Highlights
Throughout his career, Vitkavage has worked with prestigious organizations such as AT&T Bell Laboratories and the Research Triangle Institute. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in technology.
Collaborations
Vitkavage has collaborated with notable colleagues, including David P Favreau and Cheryl Anne Bollinger. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.
Conclusion
Daniel J Vitkavage's contributions to the field of semiconductor technology are noteworthy and reflect his dedication to innovation. His patents and career achievements highlight the importance of collaboration and expertise in driving technological advancements.
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