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For the Inventor, By the Inventor

San Jose, CA, United States of America

Daniel Clarence Lubben

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.2

ph-index = 6

Forward Citations = 97(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2005 - 2010)
  • San Jose, CA (US) (2005 - 2018)

Company Filing History:

goldMedal11 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2005-2018

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):
1. 10047430 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2018-08-14),
2. 8764949 - Prediction and compensation of erosion in a magnetron sputtering target (2014-07-01),
3. 8696875 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2014-04-15),
4. 8668816 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2014-03-11),
5. 8518220 - Method for predicting and compensating erosion in a magnetron sputtering target (2013-08-27),
6. 8133360 - Prediction and compensation of erosion in a magnetron sputtering target (2012-03-13),
7. 7807030 - Small scanned magentron (2010-10-05),
8. 7674360 - Mechanism for varying the spacing between sputter magnetron and target (2010-03-09),
9. 7169271 - Magnetron executing planetary motion adjacent a sputtering target (2007-01-30),
10. 6852202 - Small epicyclic magnetron with controlled radial sputtering profile (2005-02-08),
11. 6841050 - Small planetary magnetron (2005-01-11),

Title: Innovations by Daniel Clarence Lubben: Pioneering Advancements in Sputtering Technology

Introduction

Daniel Clarence Lubben, an inventive mind based in San Jose, California, has made significant contributions to the field of sputtering technology with a remarkable portfolio of 11 patents. His innovative approaches and methodologies have positively influenced the efficiency and effectiveness of material deposition processes.

Latest Patents

Among his latest inventions, Lubben has developed advanced systems for Self-ionized and Inductively-coupled Plasma for Sputtering and Resputtering. This innovation focuses on a magnetron sputter reactor that facilitates the sputtering deposition of materials such as tantalum, tantalum nitride, and copper. His method allows for the promotion of self-ionized plasma (SIP) sputtering and inductively coupled plasma (ICP) sputtering, either together or in alternate chambers. This technique aims to improve bottom coverage by utilizing ICP resputtering in one chamber and SIP in another, thus enhancing deposition quality. Another notable patent addresses the Prediction and Compensation of Erosion in a Magnetron Sputtering Target, which involves dynamically adjusting the magnetron height during scans to compensate for erosion, thus ensuring optimal performance and longevity of the sputtering targets.

Career Highlights

Lubben is affiliated with Applied Materials, Inc., a leading company in the semiconductor and display industries, specializing in innovative equipment, services, and software for manufacturing electronic devices. His work at Applied Materials has been instrumental in developing cutting-edge technologies that drive the industry forward.

Collaborations

Collaborating with esteemed colleagues such as Peijun Ding and Michael A. Miller, Lubben has contributed to a team dynamic that fosters innovation and the successful development of groundbreaking technologies in material deposition.

Conclusion

Daniel Clarence Lubben stands out as a prominent inventor within the realm of sputtering technology. His contributions and innovative patents significantly impact the efficiency of material deposition processes in various high-tech industries. As he continues to push the boundaries of technology, Lubben's work inspires future advancements and draws attention to the vital role of inventors in shaping modern manufacturing techniques.

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