The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Apr. 17, 2003
Michael Andrew Miller, Sunnyvale, CA (US);
James H. Tsung, San Jose, CA (US);
Daniel C. Lubben, Santa Clara, CA (US);
Ilyoung Richard Hong, San Jose, CA (US);
Peijun Ding, San Jose, CA (US);
Michael Andrew Miller, Sunnyvale, CA (US);
James H. Tsung, San Jose, CA (US);
Daniel C. Lubben, Santa Clara, CA (US);
Ilyoung Richard Hong, San Jose, CA (US);
Peijun Ding, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A small unbalanced magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly may pass through the target center, thus allowing full target coverage. A geared planetary mechanism may include a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plate supporting a cantilevered magnet assembly on the side of the drive plate facing the target. The erosion profile may be controlled by varying the rotation rate through the rotation cycle or by modulating the target power. A second planetary stage may be added or non-circular gears be used. Auxiliary electromagnetic coils may create a focusing magnetic field.