San Jose, CA, United States of America

Ilyoung R Hong

USPTO Granted Patents = 9 

Average Co-Inventor Count = 4.7

ph-index = 6

Forward Citations = 134(Granted Patents)


Company Filing History:


Years Active: 2001-2021

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: The Innovative Contributions of Ilyoung R Hong

Introduction

Ilyoung R Hong, a prolific inventor based in San Jose, CA, has made significant strides in the field of semiconductor manufacturing. With a total of 9 patents to his name, his innovative spirit and technical prowess are evident in his latest advancements that aim to enhance the deposition processes in processing chambers.

Latest Patents

Among his recent inventions is a patent describing a "Method of removal of sharp corners from diffuser plate." This method revolutionizes the manufacturing of diffuser plates for Plasma Enhanced Chemical Vapor Deposition (PECVD) chambers. By employing a compliant abrasive medium, the sharp edges at the corners of gas diffuser plate output holes are rounded. This innovation not only minimizes the flaking of deposited materials on the downstream side but also reduces the generation of undesirable particles during the PECVD deposition process.

Another notable patent by Ilyoung is the "Process kit for substrate processing chamber." This invention comprises a sophisticated shield and ring assembly designed to minimize process deposits on internal chamber components and the overhang edge of substrates. The shield features a cylindrical band surrounding a sputtering target and substrate support, along with a support ledge and a U-shaped channel with gas conductance holes. Furthermore, the ring assembly includes a deposition ring and cover ring that incorporates a bulb-shaped protuberance, enhancing overall efficiency.

Career Highlights

Ilyoung R Hong has dedicated his professional career to Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment sector. His contributions have been pivotal in advancing the technologies used in this rapidly evolving industry. His innovations reflect a commitment to improving process efficiencies and material integrity, which are paramount in semiconductor fabrication.

Collaborations

Throughout his career, Ilyoung has collaborated with esteemed colleagues, including Peijun Ding and James H Tsung. Their teamwork has fostered a dynamic environment of innovation at Applied Materials, leading to advancements that benefit the entire semiconductor manufacturing community.

Conclusion

Ilyoung R Hong exemplifies the spirit of innovation within the semiconductor industry. His patents demonstrate a deep understanding of the challenges faced in manufacturing processes and a relentless pursuit of effective solutions. As he continues to push the boundaries of technology, Ilyoung remains a vital figure in shaping the future of semiconductor equipment and processes.

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