Daniel Chiu

Title: Innovations of Daniel Chiu in Chemical-Mechanical Polishing Technology

Introduction

Daniel Chiu is an accomplished inventor based in Hsinchu Hsien, Taiwan, known for his groundbreaking contributions to the field of chemical-mechanical polishing technology. With a remarkable portfolio of 6 patents, Chiu has played a significant role in advancing fabrication processes that are essential in semiconductor manufacturing.

Latest Patents

One of Chiu's latest patents is focused on a chemical-mechanical polishing machine and its associated fabrication process. This machine features a retainer ring with multiple slurry passages located at the bottom, facilitating effective wafer planarization. The specific design of the retainer ring includes a circular path that enhances the flow of slurry, optimizing the polishing process within the machine. This innovative approach allows for improved efficiency and effectiveness in the application of chemical-mechanical polishing.

Career Highlights

Throughout his career, Daniel Chiu has made significant contributions while working at various organizations, including United Microelectronics Corporation. His initiatives have been pivotal in refining processes that are critical to semiconductor fabrication, positioning him as a notable figure in the industry.

Collaborations

During his professional journey, Chiu has collaborated with esteemed colleagues such as Peng-Yih Peng and Juen-Kuen Lin. Together, these professionals have fostered innovation and driven advancements in chemical-mechanical polishing technology, working towards enhancing process efficiencies in semiconductors.

Conclusion

Daniel Chiu's inventive prowess and commitment to innovation make him a key contributor to the field of chemical-mechanical polishing. His patents and collaborations are a testament to his dedication to improving manufacturing processes, solidifying his legacy as a significant inventor in the technology sector.