Daniel Boatright

Title: Innovations of Daniel Boatright

Introduction

Daniel Boatright is an accomplished inventor based in Estacada, Oregon. He has made significant contributions to the field of semiconductor processing, holding a total of 2 patents. His work focuses on improving the efficiency and safety of semiconductor manufacturing processes.

Latest Patents

One of Boatright's latest patents is titled "Apparatuses for uniform fluid delivery in a multi-station semiconductor processing chamber." This patent describes a system that includes a semiconductor processing chamber with multiple processing stations, manifold trunks, valves, and fluid manifolds. The design aims to enhance the uniformity of fluid delivery across various processing stations.

Another notable patent is "Etching metal-oxide and protecting chamber components." This invention outlines methods and chemistries for etching metal-oxide films, specifically tin oxide (SnO) films. The method utilizes thionyl chloride (SOCl) chemistry, achieving an etch rate up to ten times higher than traditional chlorine chemistry. This innovation not only improves efficiency but also enhances safety for both human operators and machinery.

Career Highlights

Daniel Boatright is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His role involves developing advanced technologies that contribute to the efficiency and safety of semiconductor processing.

Collaborations

Boatright has collaborated with notable colleagues, including Akhil N Singhal and Dustin Zachary Austin. Their combined expertise has fostered innovative solutions in the semiconductor industry.

Conclusion

Daniel Boatright's contributions to semiconductor processing through his patents and work at Lam Research Corporation highlight his role as a key innovator in the field. His inventions not only advance technology but also prioritize safety and efficiency in manufacturing processes.