This inventor holds 5 USPTO granted patents. Top assignees: Fujitsu Corporation, Kyushu Fujitsu Electronics Limited. Active years: 1993-1999.
Company Filing History:
5 out of 39,367 
3 out of 36 Years Active: 1993-1999
Title: Daitei Shin: Innovator in Silicon Dioxide Film Technology
Introduction
Daitei Shin is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of processes for forming silicon dioxide films. With a total of 5 patents to his name, Shin's work has had a substantial impact on the industry.
Latest Patents
One of his latest patents is a process for forming silicon dioxide film. This innovative process allows for the creation of an inorganic film that can be applied at a relatively large thickness, equivalent to or greater than that of an organic SOG. Notably, this method avoids oxidation by O.sub.2 plasma treatment, which is commonly used in semiconductor fabrication. The process involves coating polysilazane on a base, which is then converted into a silicon dioxide film.
Career Highlights
Throughout his career, Daitei Shin has worked with notable companies such as Fujitsu Corporation and Kyushu Fujitsu Electronics Limited. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the field.
Collaborations
Shin has collaborated with several talented individuals, including Hideki Harada and Masaaki Higasitani. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Daitei Shin's contributions to the semiconductor industry, particularly through his patented processes for forming silicon dioxide films, highlight his role as a key innovator. His work continues to influence advancements in technology and semiconductor fabrication.