This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2017-2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yamanashi, JP (2017)
- Boise, ID (US) (2018)
Company Filing History:
Years Active: 2017-2018
Title: Daisuke Katayama: Innovator in Silicon Nitride Film Processing
Introduction
Daisuke Katayama is a prominent inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor processing, particularly in the development of methods for silicon nitride films. With a total of 2 patents, his work has advanced the technology used in various applications.
Latest Patents
Katayama's latest patents include a processing method of silicon nitride film and a forming method of silicon nitride film. The processing method allows for the modification of a silicon nitride film to achieve required characteristics even when formed at low temperatures using chemical vapor deposition (CVD). This innovative approach involves modifying the surface of the silicon nitride film by irradiating it with microwave hydrogen plasma, effectively removing hydrogen from the surface with atomic hydrogens present in the plasma. His second patent details a plasma processing method and apparatus that includes growing a polycrystalline silicon layer and exposing it to hydrogen radicals, enhancing the processing capabilities of silicon-based materials.
Career Highlights
Daisuke Katayama is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has positioned him as a key player in advancing semiconductor technologies. His innovative methods have the potential to improve the efficiency and effectiveness of silicon nitride film applications.
Collaborations
Katayama has collaborated with notable colleagues such as Toshio Nakanishi and Minoru Honda. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.
Conclusion
Daisuke Katayama's contributions to the field of semiconductor processing, particularly through his patents on silicon nitride films, highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future advancements in semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile