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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10017853 B1

PDFFull Text
Date of Patent:
Jul. 10, 2018

Filed:

Jun. 07, 2017

Processing method of silicon nitride film and forming method of silicon nitride film

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Toshio Nakanishi, Nirasaki, JP;

Daisuke Katayama, Boise, ID (US);

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Mounir Amer

Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 29/51 (2006.01); H01L 21/475 (2006.01); C23C 16/34 (2006.01); C23C 16/46 (2006.01); C23C 16/511 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/345 (2013.01); C23C 16/46 (2013.01); C23C 16/511 (2013.01); C23C 16/56 (2013.01); H01L 21/31 (2013.01); H01L 21/475 (2013.01); H01L 29/518 (2013.01);
Abstract

A processing method of a silicon nitride film can modify a silicon nitride film such that the silicon nitride film has a required characteristic even if it is formed at a low temperature by CVD. The processing method of the silicon nitride film formed on a substrate by plasma CVD includes modifying a surface portion of the silicon nitride film by irradiating microwave hydrogen plasma to the silicon nitride film to remove hydrogens in the surface portion of the silicon nitride film with atomic hydrogens contained in the microwave hydrogen plasma.

Find Patent Forward Citations

Nakanishi, Toshio. (2018). Processing method of silicon nitride film and forming method of silicon nitride film (U.S. Patent No. 10017853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10017853

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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