Location History:
- Osaka, JP (2007 - 2011)
- Kyoto, JP (2012)
Company Filing History:
6 out of 16,453 
1 out of 27,375 
Years Active: 2007-2012
Title: Daisaku Ikoma: Innovator in Semiconductor Technology
Introduction
Daisaku Ikoma is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work has been instrumental in advancing the design and fabrication of semiconductor devices.
Latest Patents
One of Ikoma's latest patents focuses on a semiconductor device and the method for fabricating it. This innovative device includes a gate insulating film formed on a semiconductor region of a first conductivity type, along with a gate electrode positioned on the gate insulating film. The design features an offset spacer on the side surface of the gate electrode, which is interposed between an inner sidewall that has an L-shaped cross-section. Additionally, an insulating film covers the gate electrode, offset spacer, inner sidewall, and part of the semiconductor region located laterally outward from the inner sidewall. Another aspect of his patent involves the formation of gate electrodes that share geometry and connect to impurity diffusion regions, effectively suppressing the influence of increased gate length due to hammerhead and gate flaring.
Career Highlights
Throughout his career, Daisaku Ikoma has worked with notable companies such as Panasonic Corporation and Matsushita Electric Industrial Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Ikoma has collaborated with esteemed colleagues, including Kyoji Yamashita and Katsuhiro Ootani. These partnerships have fostered an environment of innovation and creativity, leading to the development of advanced semiconductor solutions.
Conclusion
Daisaku Ikoma's contributions to semiconductor technology are noteworthy, with a solid portfolio of patents that reflect his expertise and innovative spirit. His work continues to influence the industry and pave the way for future advancements in semiconductor devices.