Dai-Luon Lo is a prominent inventor based in Dahu Township, Miaoli County, Taiwan. He has made significant contributions to the field of quantum-dot technology, holding a total of 3 patents. His work focuses on methods for manufacturing quantum-dot elements, which have applications in various advanced technologies.

Latest Patents

One of Dai-Luon Lo's latest patents is titled "Process for forming a quantum-dot particle layer on a substrate." This innovative method utilizes a reaction chamber for evaporating or sputtering at least one electrode layer or buffer layer on a substrate. The process includes a substrate-supporting base located inside the reaction chamber to fix the substrate. An atomizer is employed, which has a gas inlet and a sample inlet. The gas inlet and sample inlet feed the atomizer with a gas and a precursor solution containing functionalized quantum dots, respectively. This method results in a quantum-dot layer with uniformly distributed quantum dots, integrating the processes for forming the quantum-dot layer, buffer layer, and electrode layer within the same chamber.

Another significant patent by Lo is the "Method of manufacturing a quantum-dot element." This method involves providing a deposition chamber with at least one atomizer and a substrate-supporting base. A sample solution composed of functionalized quantum dots dispersed in a solvent is prepared. A substrate is placed on the substrate-supporting base in the deposition chamber. The sample solution and gas are then transferred into the atomizer through their respective inlets, generating quantum-dot droplets that deposit on the substrate. This method ensures a uniform distribution of small-sized quantum dots, significantly improving the quality of the quantum-dot element.

Career Highlights

Dai-Luon Lo is associated with the Industrial Technology Research Institute, where he continues to advance his research in quantum-dot technology. His innovative approaches have positioned him as a key figure in the development of new manufacturing techniques for quantum-dot elements.

Collaborations

Lo collaborates with notable colleagues, including Hsueh-Shih Chen and Gwo-Yang Chang, contributing to a dynamic research environment that fosters innovation and technological advancement.

Conclusion

Dai-Luon Lo's contributions to quantum-dot technology through his patents and research at the Industrial Technology Research Institute highlight his role as an influential inventor in the field. His innovative methods are paving the way for advancements

Profile summary based on public USPTO records.

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