Tokai, Japan

Dai Fujii

USPTO Granted Patents = 10 

Average Co-Inventor Count = 6.1

ph-index = 4

Forward Citations = 31(Granted Patents)


Location History:

  • Hitachi, JP (2003 - 2006)
  • Tokai, JP (2005 - 2011)
  • Ibaraki, JP (2011)

Company Filing History:


Years Active: 2003-2011

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10 patents (USPTO):Explore Patents

Title: The Innovations of Dai Fujii

Introduction

Dai Fujii is a prominent inventor based in Tokai, Japan, known for his significant contributions to the field of inspection apparatuses and image processing technologies. With a total of 10 patents to his name, Fujii has made remarkable advancements that enhance the efficiency and accuracy of substrate inspections.

Latest Patents

Fujii's latest patents include an inspection apparatus designed for inspecting patterns of a substrate. This innovative apparatus features a setting unit with multiple cell areas of varying comparison pitches, allowing for comprehensive inspections based on specific settings. The apparatus is capable of reading image data for both inspection and reference images, incorporating position information of defective images and identification information for cell or die comparisons. Additionally, it includes a unit for setting multiple inspection threshold values for various areas, ensuring thorough inspections across different parameters.

Another notable patent is an image processing unit for wafer inspection tools. This advanced apparatus performs continuous cell-to-cell and die-to-die comparison inspections, utilizing multiple processors for parallel processing. It includes mechanisms for cutting image data at partition boundaries and distributing the data among processors, ultimately assembling the results of the processing. This design enhances the efficiency of inspections by allowing for greater overlap and precision.

Career Highlights

Throughout his career, Dai Fujii has worked with esteemed companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these organizations has contributed to his expertise in developing cutting-edge inspection technologies.

Collaborations

Fujii has collaborated with notable colleagues, including Masahiro Ohashi and Takeiki Aizono, further enriching his work and innovations in the field.

Conclusion

Dai Fujii's contributions to the field of inspection apparatuses and image processing have significantly advanced the technology used in substrate inspections. His innovative patents and collaborations reflect his dedication to enhancing efficiency and accuracy in this critical area of research and development.

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