The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Sep. 22, 2009
Koichi Hayakawa, Hitachinaka, JP;
Hiroshi Miyai, Hitachi, JP;
Masaaki Nojiri, Hitachinaka, JP;
Michio Nakano, Hitachinaka, JP;
Takako Fujisawa, Tokai, JP;
Dai Fujii, Tokai, JP;
Koichi Hayakawa, Hitachinaka, JP;
Hiroshi Miyai, Hitachi, JP;
Masaaki Nojiri, Hitachinaka, JP;
Michio Nakano, Hitachinaka, JP;
Takako Fujisawa, Tokai, JP;
Dai Fujii, Tokai, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.