Daesung Lim

Title: Daesung Lim: Innovator in Thin Film Etching Technologies

Introduction

Daesung Lim is a distinguished inventor based in Iksan-si, South Korea, known for his contributions to the field of thin film etching. With a total of three patents to his name, Lim has made significant advancements in developing etchant compositions and methods that enhance the efficiency and quality of metal pattern formation.

Latest Patents

Lim's latest patents showcase his innovative approach to etching technologies. One notable patent is for a thin film etchant composition that prevents re-adsorption of an etched metal while ensuring uniform etching of thin films. This composition includes approximately 43 wt % to 46 wt % of phosphoric acid, 5 wt % to 8 wt % of nitric acid, 10 wt % to 17 wt % of acetic acid, 1 wt % to 3 wt % of iron nitrate, 0.7 wt % to 1.5 wt % of phosphate, alongside deionized water as the remaining component.

Another key patent involves an etchant utilized in the manufacturing of display devices. This etchant comprises 1 wt % to 15 wt % of sulfurized peroxide, 5 wt % to 10 wt % of nitric acid, 20 wt % to 40 wt % of organic acid, with small percentages of ferric nitrate, ionic sequestrant, and corrosion inhibitor, with deionized water completing the formulation.

Career Highlights

Throughout his career, Daesung Lim has collaborated with notable companies in the technology sector, including Samsung Display Co., Ltd. and Dongwoo Fine-Chem Co., Ltd. His work has been pivotal in enhancing the performance of display technologies and etching processes, establishing him as a credible figure in the field.

Collaborations

Lim's collaborative efforts extend to notable coworkers such as Youngchul Park and Sangtae Kim. Their combined expertise and innovative insights have contributed to the successful development of advanced etchant solutions and methodologies, further driving progress in thin film technology.

Conclusion

Daesung Lim's innovative contributions to the field of etching technology demonstrate his commitment to advancing industrial processes. Through his patents and collaborative work, he has significantly impacted the way thin films are etched, enhancing both the quality and efficiency of manufacturing in the display sector.