This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: The Innovations of Da-Ching Chiou
Introduction
Da-Ching Chiou is a notable inventor based in Chiayi, Taiwan. He has made significant contributions to the field of electronic device design, particularly in the area of gate oxide technology. His innovative approach has led to the development of a unique testkey design pattern that enhances measurement accuracy in electronic devices.
Latest Patents
Da-Ching Chiou holds a patent for a "Testkey design pattern for gate oxide." This patent includes a least one conductive contact, at least one conductive line of a first width vertically and electrically connected to the conductive contact, and at least one pair of source and drain respectively directly connected to each side of the conductive line. The pair of source and drain, along with part of the conductive line of a first length directly connected to the source and drain, form an electronic device. The testkey design patterns are advantageous in measuring capacitance with less error and for better gate oxide thickness extraction. He has 1 patent to his name.
Career Highlights
Da-Ching Chiou is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on improving electronic device performance through innovative design patterns. His contributions have been instrumental in advancing the technology used in modern electronics.
Collaborations
Da-Ching Chiou has collaborated with several talented individuals in his field, including Min-Yi Chang and Tung-Hsing Lee. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Da-Ching Chiou's work exemplifies the spirit of innovation in the electronics industry. His contributions, particularly in gate oxide technology, have paved the way for more accurate and efficient electronic devices. His ongoing efforts continue to inspire future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
