United Microelectronics Corp.

Da-Ching Chiou

Shyh-Fann Ting

Cheng-Tung Huang

Tzyy-Ming Cheng

Tung-Hsing Lee

Sheng-Hao Lin

Chien-Hsing Lee

Min-Yi Chang

Sun-Chin Wei

A testkey design pattern includes a least one conductive contact, at least one conductive line of a first width vertically and electrically connected to the conductive contact, and at least one pair of source and drain respectively directly connected to each side of the conductive line. The pair of source and drain and part of the conductive line of a first length directly connected to the source and drain form an electronic device. The testkey design patterns are advantageous in measuring capacitance with less error and for better gate oxide thickness extraction.

Testkey design pattern for gate oxide

Growing community of inventors

Chiayi, Taiwan

Da-Ching Chiou