This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Da-Bai Jiang: Innovator in Exposure Apparatus Technology
Introduction
Da-Bai Jiang is a notable inventor based in Singapore, recognized for his contributions to the field of exposure apparatus technology. He has developed innovative methods that enhance the precision and efficiency of exposure processes in semiconductor manufacturing.
Latest Patents
Da-Bai Jiang holds a patent for a "Monitoring method of exposure apparatus." This patent involves a sophisticated technique for measuring the top critical dimension (TCD) and bottom critical dimension (BCD) of test patterns formed on photo-sensitive material layers. The method calculates dose deviation (ΔE) and focus deviation (ΔF) using specific equations that incorporate constants and theoretical values. This innovation is crucial for ensuring the accuracy of exposure processes in the semiconductor industry.
Career Highlights
Da-Bai Jiang is currently employed at United Microelectronics Corporation, where he applies his expertise in exposure technology. His work has significantly contributed to advancements in semiconductor manufacturing processes, making him a valuable asset to his organization.
Collaborations
Da-Bai Jiang collaborates with Ching-Shu Lo, a fellow innovator in the field. Their partnership has fostered the development of cutting-edge technologies that push the boundaries of exposure apparatus capabilities.
Conclusion
Da-Bai Jiang's innovative work in exposure apparatus technology exemplifies the impact of dedicated inventors in the semiconductor industry. His contributions continue to shape the future of manufacturing processes, ensuring greater precision and efficiency.