Chungwei Hsu

Title: Chungwei Hsu: Innovator in Semiconductor Manufacturing

Introduction

Chungwei Hsu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His innovative approaches have advanced the technology used in chip production.

Latest Patents

One of Chungwei Hsu's latest patents is a method of achieving CD linearity control for full-chip CPL manufacturing. This method involves generating masks for printing patterns that include a plurality of features with varying critical dimensions. The process consists of several steps: obtaining data representing the pattern, defining distinct zones based on the critical dimensions, categorizing each feature into one of these zones, and modifying the mask pattern accordingly.

Career Highlights

Chungwei Hsu has worked with notable companies in the semiconductor industry, including Nan Ya Technology Corporation and ASML MaskTools B.V. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in manufacturing processes.

Collaborations

Chungwei has collaborated with several professionals in his field, including Doug Van Den Broeke and Jang Fung Chen. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Chungwei Hsu's work in semiconductor manufacturing exemplifies the spirit of innovation. His patents and collaborations reflect his commitment to advancing technology in this critical industry.