The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2000
Filed:
Aug. 03, 1999
Chungwei Hsu, Taipei, TW;
Nanya Technology Corporation, , TW;
Abstract
This invention discloses an overlay measuring mark and a method of measuring an overlay error of semiconductor used by the overlay measuring mark. This overlay measuring mark comprises a first mark formed on a first layer on a semiconductor substrate and including four bar sets, which form a first square pattern, each of said bar sets at least comprising two parallel bars relatively formed by a first slim pattern; and a second mark formed on a second layer on said first layer and including four bar formed a second square pattern, wherein said four bar relatively are formed by a second slim pattern and said second square is located in and smaller than said first square in a top view.