Company Filing History:
Years Active: 2002-2014
Title: Chung-Yeh Lee: Innovator in Power LDMOS Devices
Introduction
Chung-Yeh Lee is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of power LDMOS devices. With a total of seven patents to his name, Lee's work has had a substantial impact on the industry.
Latest Patents
Among his latest patents are innovations in power LDMOS devices and high voltage devices. One of his notable inventions is a power LDMOS device that includes a substrate, source and drain regions, gates, and trench insulating structures. This device features a substrate with a finger tip area, a finger body area, and a palm area. The source regions are strategically placed in the substrate, extending from the finger body area to the finger tip area, with neighboring source regions connected. Additionally, the drain regions are located in the substrate and extend to the palm area, with a gate positioned between the neighboring source and drain regions. Another significant patent involves a reduced surface field (RESURF) structure and a lateral diffused metal oxide semiconductor (LDMOS) device, which includes a substrate of a first conductivity type and a deep well region of a second conductivity type.
Career Highlights
Chung-Yeh Lee has worked with several notable companies throughout his career, including Episil Technologies Inc. and Macronix International Co., Ltd. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.
Collaborations
Lee has collaborated with several professionals in his field, including Shih-Kuei Ma and Chun-Ying Yeh. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Chung-Yeh Lee is a distinguished inventor whose work in power LDMOS devices has significantly advanced semiconductor technology. His innovative patents and collaborations with industry professionals highlight his commitment to excellence in his field.
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