This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2001-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hsing-chu, TW (2001)
- Hsin-chu, TW (2001 - 2003)
Company Filing History:
Years Active: 2001-2003
Title: Innovations of Chung-Yang Lin
Introduction
Chung-Yang Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) with his innovative inventions. With a total of 3 patents, Lin has developed methods and apparatuses that enhance the efficiency and effectiveness of CMP processes.
Latest Patents
One of Lin's latest patents is an "Apparatus and method for retaining moisture on a polishing pad." This invention describes a circular disc designed to retain moisture on a polishing pad during machine idling, which is crucial for maintenance or repair. The apparatus features a clam-shell configuration for easy mounting and dismounting. It includes a moisture retention means, such as brushes or a cellulosic material layer, to maintain a moisturizing environment for the polishing pad. The circular disc is preferably made of a transparent material, allowing for easy observation of the polishing pad's condition.
Another significant patent is the "Method and apparatus for off-line testing a polishing head." This invention provides a method for testing CMP polishing heads using independent sets of pressurizing, vacuuming, and venting devices. The apparatus is designed to identify defects in fluid chambers before installation, ensuring optimal performance of the CMP head.
Career Highlights
Chung-Yang Lin is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work focuses on improving CMP processes, which are essential for semiconductor fabrication. Lin's inventions have contributed to advancements in the efficiency and reliability of CMP technology.
Collaborations
Lin has collaborated with notable colleagues, including Fang-Lin Lu and Wen-Ten Chen. These collaborations have fostered innovation and development in the field of semiconductor manufacturing.
Conclusion
Chung-Yang Lin's contributions to the field of chemical mechanical polishing through his patents demonstrate his commitment to innovation and excellence. His work continues to impact the semiconductor industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile