Company Filing History:
Years Active: 2015-2022
Title: Innovations of Chung Wan Kim – A Pioneer in Plasma Etching Technologies
Introduction
Chung Wan Kim, an accomplished inventor based in Daejeon, South Korea, has made significant contributions to the field of plasma etching and light guide plate technologies. With a remarkable portfolio encompassing 11 patents, Kim's innovative approaches have positioned him as a key figure in his area of expertise. His work not only showcases technical ingenuity but also addresses the evolving needs of industries relying on precision etching methods.
Latest Patents
Among Chung Wan Kim's latest patents is a groundbreaking method for plasma etching utilizing a Faraday cage. This method involves placing an etch substrate—equipped with a metal mask—inside the cage, which features a mesh portion on its upper surface. The process includes two patterning steps: the first step forms a groove pattern with a depth gradient of 0 to 40 nm over 5 mm, while the second establishes a deeper groove pattern with a gradient of 50 to 300 nm over the same distance.
Additionally, Kim has developed a method for manufacturing a mold for a diffraction grating light guide plate, utilizing dual mask films. This innovative design incorporates four distinct pattern portions on a single surface, ultimately leading to the creation of an advanced diffraction grating light guide plate. His inventions not only enhance manufacturing efficiencies but also improve the overall quality of light guide applications.
Career Highlights
Chung Wan Kim is currently associated with LG Chem, Ltd., a leading global player in the chemical and materials industry. His role as an inventor within such a prominent company underlines his influence in advancing technological solutions. Over the years, Kim has demonstrated a continuous commitment to innovation and has contributed immensely towards enhancing the efficacy of plasma etching processes.
Collaborations
In his journey of innovation, Chung Wan Kim has collaborated with esteemed colleagues, including Song Ho Jang and Jin Woo Park. Their teamwork has fostered an environment of creativity that has led to the development of effective solutions within their respective fields. These collaborations exemplify the power of shared knowledge and expertise in driving technological advancement.
Conclusion
Chung Wan Kim stands out as a remarkable inventor, whose patents reflect both creativity and technical prowess. With a strong foundation in plasma etching and light guide plate technologies, he continues to contribute to his field, ensuring that innovations align with industry demands. As his career progresses, it will be exciting to observe the further developments he brings forth to the world of technology.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.