The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Jun. 18, 2019
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Soo Hee Kang, Daejeon, KR;
Song Ho Jang, Daejeon, KR;
Geun Sik Jo, Daejeon, KR;
Chung Wan Kim, Daejeon, KR;
Assignee:
LG CHEM, LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); B29C 33/38 (2006.01); B29L 31/00 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32651 (2013.01); B29C 33/3842 (2013.01); H01J 37/321 (2013.01); H01J 37/3244 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); B29L 2031/757 (2013.01); G02B 5/1852 (2013.01); H01J 2237/334 (2013.01);
Abstract
A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base.