Lg Chem, Ltd

Chung Wan Kim

Song Ho Jang

Bu Gon Shin

Jeong Ho Park

Jin Woo Park

Eun Kyu Her

So Young Choo

Jung Hwan Yoon

Seung Heon Lee

Ji Young Hwang

Ki-Hwan Kim

Jin Hyong Lim

Beom Mo Koo

In-Seok Hwang

Soo Hee Kang

Sujin Kim

Jae Hoon Lee

Soohee Kang

Geunsik Jo

Geun Sik Jo

Kyoung Jin Kim

A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the etch substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.

Plasma etching method using faraday cage

The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.

Method of manufacturing mold for diffraction grating light guide plate and method of manufacturing diffraction grating light guide plate

The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.

Method of manufacturing mold substrate for diffraction lattice light guide plate, and method of manufacturing diffraction lattice light guide plate

A plasma etching method using a Faraday cage, comprising: providing a Faraday cage having a mesh portion on an upper surface thereof in a plasma etching apparatus; providing a quartz substrate having a metal mask with an opening provided on one surface of the metal mask in the Faraday cage; and patterning the quartz substrate with plasma etching.

Plasma etching method using Faraday cage

A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base.

Plasma etching method using faraday box

The present application relates to an electrochromic device and a method for manufacturing the electrochromic device. The present application can provide an electrochromic device having increased productivity and improved electrochromic rate and durability, and a method for manufacturing the electrochromic device. The electrochromic device may be advantageously used in various devices such as smart windows, smart mirrors, displays, electronic papers and adaptive camouflage.

Electrochromic device

The present application relates to an electrochromic element and a method for manufacturing the same. A method for manufacturing an electrochromic element according to an exemplary embodiment of the present application comprises: forming a first electrode on a first substrate, and then forming a first electrochromic unit on the first electrode; forming a second electrode on a second substrate, and then forming a second electrochromic unit on the second electrode; and forming an electrolyte layer between the first electrochromic unit and the second electrochromic unit, in which the forming of the first electrochromic unit is carried out by an E-beam deposition method (E-beam evaporation) using a carrier gas.

Electrochromic element and method for manufacturing same

An exemplary embodiment of the present invention relates to a conductive structure body that comprises a darkening pattern layer having AlOxNy, and a method for manufacturing the same. The conductive structure body according to the exemplary embodiment of the present invention may prevent reflection by a conductive pattern layer without affecting conductivity of the conductive pattern layer, and improve a concealing property of the conductive pattern layer by improving absorbance. Accordingly, a display panel having improved visibility may be developed by using the conductive structure body according to the exemplary embodiment of the present invention.

Conductive structure body and method for manufacturing the same

Electrically-conductive structure and a production method therefor

Provided is a conductive structure body comprising: a substrate; a conductive pattern; and a darkened pattern comprising CuOx (0&#x3c;x&#x2266;1), and a method for manufacturing the same. The conductive structure body may prevent reflection due to a conductive pattern without affecting the conductivity of the conductive pattern, and may improve the concealment of the conductive pattern by improving the absorbance of the conductive structure body. Therefore, a display panel with improved visibility may be developed using the conductive structure body.

Growing community of inventors

Daejeon, South Korea

Chung Wan Kim