Chung Ta Chen

Title: Innovations of Chung Ta Chen in Semiconductor Technology

Introduction

Chung Ta Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Chung Ta Chen's latest patents include innovative methods for forming semiconductor devices. One of his notable patents involves the creation of capping layers in metal gates of transistors. This method includes forming a gate electrode in a wafer, which involves depositing a work-function layer. After the work-function layer is deposited, a treatment is performed on the wafer by soaking it in a silicon-containing gas. Following this treatment, a metal capping layer is formed over the work-function layer, and a filling metal is deposited over the metal capping layer. This process is crucial for improving the functionality of transistors in semiconductor devices.

Career Highlights

Chung Ta Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a valuable asset in the development of advanced semiconductor technologies.

Collaborations

Chung has collaborated with notable colleagues such as Tsung-Ta Tang and Yi-Ting Wang. These collaborations have further enhanced the research and development efforts within the semiconductor field.

Conclusion

Chung Ta Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor devices.