Chung-Hsiung Wang

Title: Innovations of Chung-Hsiung Wang

Introduction

Chung-Hsiung Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of technology, particularly in the area of coil manufacturing and current conducting elements. With a total of 11 patents to his name, Wang's work has had a substantial impact on various applications.

Latest Patents

Wang's latest patents include a method of manufacturing a multi-layer coil and a current conducting element. The method of manufacturing a multi-layer coil involves several steps, including providing a substrate, forming a seed layer, and plating the seed layer with multiple coil layers according to specific current densities. This innovative approach allows for the creation of a multi-layer coil with precise control over the aspect ratios of the layers. The current conducting element patent describes a structure that includes a substrate with a through hole, an electrode layer, and a conductor structure, which together form an efficient current conducting path.

Career Highlights

Chung-Hsiung Wang has established himself as a key figure in his field through his innovative patents and contributions to technology. His work at Cyntec Company has allowed him to collaborate with other talented professionals and further advance his research and development efforts.

Collaborations

Wang has worked alongside notable colleagues such as Hung-Ming Lin and Kuo-Shu Chen. Their collaborative efforts have contributed to the success of various projects and innovations within the company.

Conclusion

Chung-Hsiung Wang's contributions to the field of technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods and designs continue to shape advancements in coil manufacturing and current conducting elements.