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For the Inventor, By the Inventor

Hsin-Chu, Taiwan

Chung-Hsing Chang

USPTO Granted Patents = 15

Average Co-Inventor Count = 2.7

ph-index = 6

Forward Citations = 112(Granted Patents)


Location History:

  • Taipei, TW (2005 - 2006)
  • Chin-Mei, TW (2006)
  • Hsin-chu, TW (2004 - 2014)

Company Filing History:

goldMedal15 out of 40,674 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2004-2014

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15 patents (USPTO):Explore Patents
1. 8758963 - Holographic reticle and patterning method (2014-06-24),
2. 8227150 - Holographic reticle and patterning method (2012-07-24),
3. 7722997 - Holographic reticle and patterning method (2010-05-25),
4. 7312021 - Holographic reticle and patterning method (2007-12-25),
5. 7131102 - Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era (2006-10-31),
6. 7036108 - Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era (2006-04-25),
7. 7033947 - Dual trench alternating phase shift mask fabrication (2006-04-25),
8. 7026106 - Exposure method for the contact hole (2006-04-11),
9. 7013453 - Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA (2006-03-14),
10. 6982135 - Pattern compensation for stitching (2006-01-03),
11. 6861182 - Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process (2005-03-01),
12. 6861180 - Contact printing as second exposure of double exposure attenuated phase shift mask process (2005-03-01),
13. 6830853 - Chrome mask dry etching process to reduce loading effect and defects (2004-12-14),
14. 6830702 - Single trench alternating phase shift mask fabrication (2004-12-14),
15. 6711732 - Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era (2004-03-23),

Title: Innovations of Chung-Hsing Chang

Introduction

Chung-Hsing Chang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on advanced patterning methods that enhance the capabilities of semiconductor devices.

Latest Patents

One of his latest patents is the "Holographic Reticle and Patterning Method." This innovative method involves converting a layout pattern for an image into a holographic representation. A hologram reticle is manufactured that includes this holographic representation, which is then used to pattern a target. This technique allows for the formation of three-dimensional patterns in a photoresist layer of the target in a single patterning step. These patterns can be filled to create three-dimensional structures or utilized in multi-surface imaging compositions. Additionally, the holographic representation can be transferred to a top photoresist layer of a top surface imaging (TSI) semiconductor device, either directly or using the hologram reticle. The top photoresist layer is then used to pattern an underlying photoresist layer with the image, which ultimately patterns a material layer of the device.

Career Highlights

Chung-Hsing Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and develop new technologies. His expertise in holographic patterning methods has positioned him as a leader in the semiconductor industry.

Collaborations

He has collaborated with notable colleagues, including Burn Jeng Lin and Chin-Hsiang Lin, to further advance the field of semiconductor technology.

Conclusion

Chung-Hsing Chang's contributions to semiconductor technology through his innovative patents and collaborative efforts have made a significant impact on the industry. His work continues to pave the way for advancements in semiconductor manufacturing and design.

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