This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1999-2000.
Location History:
- Shin-Chu, TW (1999)
- Hsinchu, TW (2000)
Company Filing History:
Years Active: 1999-2000
Title: Innovations of Chung-Chieh Liu in Microelectronics
Introduction
Chung-Chieh Liu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the development of advanced chemical vapor deposition methods. With a total of 2 patents, Liu's work has been instrumental in enhancing the fabrication processes used in semiconductor manufacturing.
Latest Patents
Liu's latest patents include a "Pre deposition stabilization method for forming a void free" and an "ARC layer enhancement for reducing metal loss during via etch." The first patent describes a chemical vapor deposition (CVD) method for forming a doped silicate glass dielectric layer within microelectronics fabrication. This method involves stabilizing a silicon source material flow in a reactor chamber and subsequently depositing a doped silicate glass dielectric layer. The process ensures that an anisotropically patterned via can be formed without voids in the sidewalls.
The second patent focuses on an anti-reflective-coating (ARC) layer that not only reduces reflections during metal patterning but also acts as an effective etch inhibitor during via etching. This innovative ARC layer features a base layer of titanium, which enhances bonding with the underlying metal, thereby reducing via contact resistance and improving stability.
Career Highlights
Chung-Chieh Liu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His expertise in microelectronics has positioned him as a key player in advancing fabrication technologies. Liu's innovative approaches have contributed to the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Liu has collaborated with notable colleagues, including Been-Hon Lin and Bing-Huei Peng. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.
Conclusion
Chung-Chieh Liu's contributions to microelectronics through his patents and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as a significant inventor in the industry. His innovative methods continue to shape the future of semiconductor fabrication.