Zhubei, Taiwan

Chun Yan Chen

USPTO Granted Patents = 7 

Average Co-Inventor Count = 6.6

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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7 patents (USPTO):Explore Patents

Title: Innovations of Chun Yan Chen in Plasma-Based Processes

Introduction

Chun Yan Chen is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in plasma-based processes. With a total of 7 patents to his name, Chen's work has advanced the technology used in wafer uniformity control.

Latest Patents

One of his latest patents is titled "Devices and methods for controlling wafer uniformity in plasma-based process." This invention discloses a device that includes a housing defining a process chamber and a gas distribution plate (GDP) arranged within it. The housing features a gas inlet for receiving process gas and a gas outlet for expelling processed gas. The GDP is designed to evenly distribute the process gas within the chamber, with a unique configuration that includes a first zone and a second zone, where at least one hole in the first zone is closed.

Another significant patent is "Baffle plate for controlling wafer uniformity and methods for making the same." This invention also focuses on plasma-based processes and includes a housing with a baffle plate positioned above a wafer in the process chamber. The baffle plate is designed to control plasma distribution on the wafer and has an annular shape with distinct inner radii for its sectors.

Career Highlights

Chun Yan Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to the company's advancements in manufacturing technology.

Collaborations

Chen has collaborated with several talented individuals in his field, including Chih-Hsien Hsu and Jr-Sheng Chen, who is a woman. These collaborations have further enhanced the development of his inventions and patents.

Conclusion

Chun Yan Chen's contributions to plasma-based processes and wafer uniformity control have made a significant impact in the semiconductor industry. His innovative patents reflect his expertise and commitment to advancing technology in this field.

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