Company Filing History:
Years Active: 2023-2025
Title: Innovations of Chuang Chihchous
Introduction
Chuang Chihchous is a notable inventor based in Fongshan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
One of Chuang's latest patents is for a plating membrane. This innovative plating membrane includes a support structure that extends radially outward from a nozzle, directing a flow of plating solution toward a wafer. The design features a frame supported by the structure, with an inner wall angled outward from the nozzle. This unique angle improves the uniformity of the plating solution flow, minimizes the redirection of the solution inward, and reduces voids in high aspect ratio trenches of the wafer. Another significant patent involves a semiconductor arrangement that comprises an isolation structure with at least two electrical insulator layers. This arrangement includes a first electrical insulator layer situated in a trench within a semiconductor substrate, along with a second layer positioned over the first.
Career Highlights
Chuang Chihchous is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Chuang has collaborated with esteemed colleagues such as Yu-Lung Yeh and Yung-Hsiang Chen. Their combined expertise has fostered innovation and development in their respective projects.
Conclusion
Chuang Chihchous is a prominent figure in the semiconductor field, recognized for his innovative patents and contributions to technology. His work continues to influence the industry and drive advancements in semiconductor manufacturing processes.