Taichung, Taiwan

Chuan-Yuan Lin


Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 34(Granted Patents)


Location History:

  • Taipei, TW (2003 - 2006)
  • Taichung, TW (2007)

Company Filing History:


Years Active: 2003-2007

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3 patents (USPTO):Explore Patents

Title: Chuan-Yuan Lin: Innovator in Semiconductor Technology

Introduction

Chuan-Yuan Lin is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in defect inspection and classification methods. With a total of 3 patents to his name, Lin continues to push the boundaries of innovation in his industry.

Latest Patents

One of Lin's latest patents is a "Progressive self-learning defect review and classification method." This method enhances wafer or mask defect inspection by identifying and classifying defects based on their resemblance. The process involves performing image processing on scanned defect images, aligning them with stored digitized images, and classifying the defects accordingly.

Another notable patent is the "Method for applying a defect finder mark to a backend photomask making process." This method includes inspecting a photomask and repairing defects, utilizing a defect finder mark implementation routine. This routine deposits a mark adjacent to defects, ensuring reliable location identification despite variations in image resolution and stage movement.

Career Highlights

Chuan-Yuan Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving defect detection and classification processes, which are crucial for maintaining the quality of semiconductor products.

Collaborations

Lin collaborates with talented colleagues, including Chang-Cheng Hung and Tyng-Hao Hsu. Their combined expertise contributes to the advancement of semiconductor technologies and innovations.

Conclusion

Chuan-Yuan Lin is a key figure in the semiconductor industry, known for his innovative patents and contributions to defect inspection methods. His work continues to influence the field and drive advancements in technology.

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