The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Nov. 16, 2001
Chang Cheng Hung, Hsin-Chu, CN;
Chuan-yuan Lin, Taipei, TW;
Tyng-hao Hsu, Hsin-Chu, TW;
Shu-chun Lin, Tao-Yung, TW;
Chin-hsiang Lin, Kao-Hsiung, TW;
Chang Cheng Hung, Hsin-Chu, CN;
Chuan-Yuan Lin, Taipei, TW;
Tyng-Hao Hsu, Hsin-Chu, TW;
Shu-Chun Lin, Tao-Yung, TW;
Chin-Hsiang Lin, Kao-Hsiung, TW;
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Abstract
A back-end method for photomask making generally includes the steps of inspecting a photomask and repairing each defect on the photomask. The step of inspecting the photomask preferably comprises a defect finder mark implementation routine. In general, when inspecting the photomask for defects, the defect finder mark implementation routine deposits a defect finder mark on the photomask via a mark installer (not shown) included with a mask marking inspection system. Deposition of the defect finder mark includes establishing a location that is adjacent to the defect and establishing a size that is detectable by a mask repair device (not shown). By deposition on the photomask, the defect finder mark reliably facilitates location of the corresponding defect despite variations in image resolution and stage movement between the mask marking inspection system and the mask repair device.