The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Dec. 20, 2002
Chang-cheng Hung, Jubei, TW;
Tyng-hao Hsu, Hsinchu, TW;
Chin-hsiang Lin, Hsinchu, TW;
Chuan-yuan Lin, Taichung, TW;
Shin-ying Chen, Hsinchu, TW;
Chang-Cheng Hung, Jubei, TW;
Tyng-Hao Hsu, Hsinchu, TW;
Chin-Hsiang Lin, Hsinchu, TW;
Chuan-Yuan Lin, Taichung, TW;
Shin-Ying Chen, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A progressive self-learning (PSL) method is provided for enhancing wafer or mask defect inspection review and classification by identifying a plurality of wafer or mask defects, and by classifying each of the plurality of defects according to an extent of resemblance of each defect. The method having the steps of: performing image processing on a scanned defect image; aligning the scanned defect image with a just-stored digitized defect image; matching the scanned defect image with a just-stored digitized defect image; and classifying the scanned defect image.