Christopher W Blaufus

Title: The Innovations of Christopher W. Blaufus

Introduction

Christopher W. Blaufus is a notable inventor based in San Jose, CA, with a focus on metrology systems. He holds a total of 4 patents that showcase his contributions to the field of precision measurement and substrate handling.

Latest Patents

One of his latest patents is titled "Transferring, buffering and measuring a substrate in a metrology system." This invention features a chuck that securely clamps a substrate using various means, such as vacuum or electrostatic force. The chuck is equipped with lift pins that elevate the substrate, allowing for different types of measurements, including film thickness and radius of curvature. These measurements are crucial for determining the stress on the substrate. Another significant patent is the "Eddy current sensor with concentric confocal distance sensor." This metrology instrument enhances measurement accuracy by integrating an eddy current sensor with a confocal distance sensor, thereby minimizing errors and maximizing throughput.

Career Highlights

Christopher is currently employed at Nanometrics Inc., where he applies his expertise in metrology and precision measurement. His work has significantly advanced the capabilities of measurement instruments used in various industries.

Collaborations

He collaborates with talented coworkers, including Blaine R. Spady and Dan M. Colban, who contribute to the innovative environment at Nanometrics Inc.

Conclusion

Christopher W. Blaufus is a distinguished inventor whose work in metrology has led to significant advancements in substrate measurement technologies. His patents reflect a commitment to improving precision and efficiency in the field.