The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2007

Filed:

Dec. 16, 2003
Applicants:

Jonathan M. Madsen, Sunnyvale, CA (US);

Jiangtao HU, Alameda, CA (US);

Christopher W. Blaufus, San Jose, CA (US);

Inventors:

Jonathan M. Madsen, Sunnyvale, CA (US);

Jiangtao Hu, Alameda, CA (US);

Christopher W. Blaufus, San Jose, CA (US);

Assignee:

Nanometrics Incorporated, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); A61N 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chuck that clamps a substrate to the top surface using, e.g., a vacuum, electrostatic force, or other appropriate means, includes a plurality of lift pins that can raise the substrate off the top surface of the chuck. The chuck may be used with a metrology device that measures the substrate using a first type of measurement, e.g., film thickness measurement, while the substrate is held flat, and measures the substrate using a second type of measurement, e.g., radius of curvature measurement, while the substrate is supported on the lift pins. The thickness and radius of curvature measurements may then be used to determine the stress on the substrate. The lift pins may include an aperture through which a vacuum is applied through the top surface of the lift pins to the bottom of the substrate to securely hold the substrate while moving.


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