Christopher Michael Dohan

Title: Christopher Michael Dohan: Innovator in Contaminant Analyzing Metrology Systems

Introduction

Christopher Michael Dohan is a notable inventor based in Redding, Connecticut. He holds 2 patents that contribute significantly to the field of metrology and lithography. His work focuses on developing advanced inspection systems that enhance the accuracy of defect detection in various applications.

Latest Patents

Dohan's latest patents include a "Contaminant Analyzing Metrology System" and a "Method for Region of Interest Processing for Reticle Particle Detection." The first patent describes an inspection system that comprises an illumination system, a detection system, and processing circuitry. This system generates a broadband beam to illuminate the surface of an object, allowing for the detection of defects by analyzing the scattered radiation. The second patent outlines an inspection system that utilizes a radiation source to irradiate different surfaces of an object at varying depths. This system discards irrelevant image data to construct a composite image focused on the region of interest.

Career Highlights

Throughout his career, Dohan has worked with prominent companies such as ASML Holding N.V. and ASML Netherlands B.V. His contributions to these organizations have been instrumental in advancing technologies related to lithography and inspection systems.

Collaborations

Dohan has collaborated with notable professionals in his field, including Michal Emanuel Pawlowski and Aage Bendiksen. These collaborations have fostered innovation and development in the technologies he specializes in.

Conclusion

Christopher Michael Dohan is a distinguished inventor whose work in contaminant analyzing metrology systems has made a significant impact in the field. His patents reflect a commitment to advancing technology and improving defect detection methods.