Asml Holding N.v.

Asml Netherlands B.v.

Christopher Michael Dohan

Aage Bendiksen

Michal Emanuel Pawlowski

Justin Lloyd Kreuzer

Johannes Onvlee

Peter Conrad Kochersperger

Roberto B Wiener

James Hamilton Walsh

Arun Mahadevan Venkataraman

Kirill Urievich Sobolev

An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam and illuminates surface of an object with the broadband illumination beam. The broadband beam has a continuous spectral range. The detection system receives radiation scattered at the surface and by a structure near the surface. The detection system generates a detection signal based on an optical response to the broadband illumination beam. The processing circuitry analyzes the detection signal. The processing circuitry distinguishes between a spurious signal and a signal corresponding to a defect on the surface based on the analyzing. The spurious signal is diminished for at least a portion of the continuous spectral range.

Contaminant analyzing metrology system, lithographic apparatus, and methods thereof

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

Method for region of interest processing for reticle particle detection

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Redding, CT, United States of America

Christopher Michael Dohan