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For the Inventor, By the Inventor

Menlo Park, CA, United States of America

Christopher G Talbot

This inventor holds 22 USPTO granted patents and 1 published patent application, primarily in Additive Manufacturing. Top assignees: Schlumberger Technologies, Inc., Applied Materials, Inc., Applied Materials Israel Limited. Active years: 1992-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Christopher G Talbot. Retrieved from https://idiyas.com/inventor/christopher-g-talbot

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 22 

% Patents Active = 95.5

Average Co-Inventor Count = 2.3

ph-index = 14

Forward Citations = 1,252(Granted Patents)


Location History:

  • Redwood City, CA (US) (2000)
  • Menlo Park, CA (US) (1992 - 2003)
  • Emerald Hills, CA (US) (2001 - 2019)

Company Filing History:

goldMedal13 out of 129 
 
Schlumberger Technologies, Inc.
 patents
silverMedal8 out of 14,502 
 
Applied Materials, Inc.
 patents
bronzeMedal1 out of 574 
 
Applied Materials Israel Limited
 patents

Years Active: 1992-2019

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Areas of Expertise:
Energy Beam Control
Additive Manufacturing
Defect Detection
Semiconductor Inspection
EUV Substrate Inspection
Focused Ion Beam
Electrical Waveforms
Patterned Substrates
Flip-Chip ICs
Probe Point Placement
FIB Milling
Layout Overlay
22 patents (USPTO):Explore Patents
1. 10421125 - Controlling an intensity profile of an energy beam in additive manufacturing based on travel direction or velocity (2019-09-24),
2. 10307822 - Controlling an intensity profile of an energy beam with a deformable mirror in additive manufacturing (2019-06-04),
3. 9915621 - Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof (2018-03-13),
4. 7602197 - High current electron beam inspection (2009-10-13),
5. 7253645 - Detection of defects in patterned substrates (2007-08-07),
6. 6914441 - Detection of defects in patterned substrates (2005-07-05),
7. 6539106 - Feature-based defect detection (2003-03-25),
8. 6518571 - Through-the-substrate investigation of flip-chip IC's (2003-02-11),
9. 6509750 - Apparatus for detecting defects in patterned substrates (2003-01-21),
10. 6504393 - Methods and apparatus for testing semiconductor and integrated circuit structures (2003-01-07),
11. 6252412 - Method of detecting defects in patterned substrates (2001-06-26),
12. 6225626 - Through-the-substrate investigation of flip chip IC's (2001-05-01),
13. 6091249 - Method and apparatus for detecting defects in wafers (2000-07-18),
14. 5959458 - Method and apparatus for measuring electrical waveforms using atomic (1999-09-28),
15. 5821549 - Through-the-substrate investigation of flip-chip IC's (1998-10-13),

Title: The Innovative Mind of Christopher G Talbot

Introduction: Christopher G Talbot, a visionary inventor based in Menlo Park, CA, has made significant contributions to the world of technology and innovation.

Latest Patents: Christopher G Talbot holds several patents in various fields, including artificial intelligence, renewable energy, and medical devices. His most recent patent focuses on a groundbreaking technology for sustainable water purification.

Career Highlights: With a career spanning over two decades, Christopher G Talbot has worked for renowned tech companies in Silicon Valley, leading research and development teams to create cutting-edge solutions. His innovative approach has led to the successful commercialization of several products.

Collaborations: Throughout his career, Christopher G Talbot has collaborated with top researchers, engineers, and scientists from prestigious universities and research institutions worldwide. These collaborations have resulted in groundbreaking inventions that have shaped the future of technology.

Conclusion: Christopher G Talbot's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventors. His work continues to inspire the next generation of innovators to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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