Coronado, CA, United States of America

Christopher G Rowan


Average Co-Inventor Count = 8.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2004-2007

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2 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Christopher G. Rowan in Lithography Technology**

Introduction

Christopher G. Rowan, based in Coronado, CA, is a notable inventor who has made significant strides in the field of lithography technology. With two patents to his name, he has focused on enhancing the efficiency and monitoring processes in integrated circuit fabrication plants. His work is pivotal for companies that rely on precise laser technology for manufacturing.

Latest Patents

Christopher's latest invention is a process monitoring system for lithography lasers. This innovative system is designed to monitor lithography lasers at integrated circuit fabrication plants. Each laser at a fabrication plant is connected to a terminal server, enabling communication with a central control server unit through a local area network. The system collects vital information from the lasers, which is then utilized to provide summary data available in a web-based format for authorized users. This advancement facilitates better oversight and operational efficiency in the complex environment of chip manufacturing.

Career Highlights

Currently, Christopher is associated with Cymer, Inc., where he continues to contribute to advancements in laser technology. His role in developing technologies that aid in the modernization of lithography processes exemplifies his commitment to innovation in the semiconductor industry.

Collaborations

At Cymer, Christopher collaborates with talented professionals such as Parthiv S. Patel and Joseph Conway. Their collective expertise contributes to driving forward the initiatives that enhance laser performance and monitoring capabilities, consequently supporting the broader architectural frameworks of integrated circuit fabrication.

Conclusion

The inventive spirit of Christopher G. Rowan is reflected in his patents and collaborations, reinforcing the importance of innovation in the field of lithography. His work not only helps in improving the manufacturing processes but also pushes the boundaries of what is possible in semiconductor technology. With continued commitment to engineering excellence, Christopher is sure to leave a lasting impact on the industry.

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