Christopher G Parker

Title: The Innovative Mind of Christopher G. Parker: Pioneering Semiconductor Technologies

Introduction

Christopher G. Parker, an accomplished inventor based in Portland, OR, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Parker's innovative methods are shaping the future of electronic devices.

Latest Patents

Parker's latest inventions include groundbreaking methods for semiconductor device fabrication. One notable patent is the "Method for making a semiconductor device having an ultra-thin high-k gate dielectric." This innovative method involves forming a buffer layer and a high-k gate dielectric layer on a substrate, followed by oxidizing the surface of the dielectric layer and forming a gate electrode on it. Another significant patent is the "Method for making a semiconductor device having a high-k gate dielectric," which describes a process that includes forming a silicon nitride layer on a high-k gate dielectric layer before the gate electrode formation.

Career Highlights

Christopher G. Parker is currently employed at Intel Corporation, a leader in semiconductor manufacturing. Throughout his career, Parker has been dedicated to advancing semiconductor technology, focusing on methods that enhance device performance and reliability.

Collaborations

In his work, Parker collaborates with talented individuals like Markus Kuhn and Ying Zhou. These partnerships foster a dynamic environment for innovation, allowing for the exchange of ideas and the development of cutting-edge technologies.

Conclusion

With his impressive portfolio of patents and his role at Intel Corporation, Christopher G. Parker exemplifies the spirit of innovation in the semiconductor industry. His contributions are paving the way for advancements that will shape the future of electronics.