Company Filing History:
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Years Active: 2004-2011
Title: Christoph Hollenstein: Innovator in Plasma Technology
Introduction
Christoph Hollenstein is a notable inventor based in Lutry, Switzerland. He has made significant contributions to the field of plasma technology, holding a total of four patents. His work focuses on innovative methods and devices that enhance the efficiency and effectiveness of plasma spraying processes.
Latest Patents
Hollenstein's latest patents include a plasma spraying device and a method for introducing a liquid precursor into a plasma gas stream. This invention relates to a plasma spraying device designed for applying coatings onto substrates through a thermal spray process. The device features a plasma torch that heats a plasma gas in a designated heating zone. The torch includes a nozzle body that forms a plasma gas stream, with an aperture running along its central longitudinal axis. This aperture consists of a convergent section with an inlet for the plasma gas, a throat section with a minimum cross-sectional area, and a divergent section with an outlet for the plasma gas stream. A unique aspect of this invention is the introduction of a penetration means that allows the liquid precursor to be effectively integrated into the plasma gas stream. Additionally, Hollenstein has developed a method for producing semi-conducting devices, which involves layering materials in a single reaction chamber while preventing contamination from doping agents.
Career Highlights
Throughout his career, Christoph Hollenstein has worked with prominent companies in the field, including Sulzer Metco AG and Oerlikon Balzers. His experience in these organizations has contributed to his expertise in plasma technology and innovation.
Collaborations
Hollenstein has collaborated with notable professionals in his field, including Ulrich Kroll and Jacques Schmitt. These partnerships have likely enriched his work and led to advancements in plasma technology.
Conclusion
Christoph Hollenstein is a distinguished inventor whose work in plasma technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to enhancing industrial processes through cutting-edge technology.